Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS

For the Ti-Al-0-C-system it is shown that it is possible to produce good quality deposits of both single-phase TiAlOC or A1203-layers and heterogeneous layers of TiAlOC and A1203 under normal pressure-CVD-conditions using a reaction gas mixture of TiC14, AlC13, H2 and a CO/C02-mixture.

Studying chemical vapor deposition processes with theoretical chemistry

Chemical Vapour Deposition for Optical Fibre Technology

At the beginning of the seventies, a break-through took place in the telecommunication research. The introduction of Chemical Vapour Deposition technology in the manufacture of optical fibres allowed both technical quality and economical convenience to realise optical networks, thus beginning the telecommunication revolution. Since that moment, a great development of the CVD techniques has been...

Chemical Vapor Deposition of Antimicrobial Polymer Coatings

There is large and growing interest in making a wide variety of materials and surfaces antimicrobial. Initiated chemical vapor deposition (iCVD), a solventless lowtemperature process, is used to form thin films of polymers on fragile substrates. To improve research efficiency, a new combinatorial iCVD system was fabricated and used to efficiently determine the deposition kinetics for two new po...

Synthesis of Boron-Aluminum Nitride Thin Film by Chemical Vapour Deposition Using Gas Bubbler

Boron included aluminium nitride (B-AlN) thin films were synthesized on silicon (Si) substrates through chemical vapour deposition ( CVD ) at 773 K (500 °C). tert-buthylamine (tBuNH2) solution was used as nitrogen source and delivered through gas bubbler. B-AlN thin films were prepared on Si-100 substrates by varying gas mixture ratio of three precursors. The structural properties of the films ...